Nanocrystalline structure and hardness of thin films
نویسندگان
چکیده
WaSiaN films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline a-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm. For WaSi films there is a good correlation between the increase of the hardness and both the increase of lattice parameter and decrease of grain size. However, for N containing films these tendencies are not systematically observed. The homogeneity in the lattice distortion seems to be more adequate to interpret the hardness variation. Generally, crystalline films have higher hardness (35–41GPa) than amorphous coatings (21–31GPa). r 2002 Elsevier Science Ltd. All rights reserved.
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